Atomic Layer Deposition - Kaariainen, Tommi a Cameron, David a Kaariainen, Marja-Leena a Sherman, Arthur

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective.